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EDITOR : Taj Muhammad Khan

Principal Scientist

Trinity College Dublin

Ireland

biography

Dr. Taj Muhammad Khan is working as a principal scientist at the materials division of the National Institute of Lasers & Optronics (NILOP), Islamabad Pakistan, and a visiting researcher at the school of physics and CRANN, Trinity College Dublin (TCD), the University of Dublin, Ireland. Taj received his Ph.D. in applied physics from the school of physics, department of physics, TCD, in the supervision of Prof. James G. Lunney (Fellow Emeritus). The structured Ph.D. work spanned over the topic of high power laser-matter interaction at atmospheric pressure and development of atmospheric pulsed deposition (APLD) method for plasmonic nanoparticle films for surface-enhanced Raman spectroscopy (SERS). In the designed study, various multifold approaches such as cold atmospheric-DBD and laser-triggered hot plasmas and supersonic gas flow were devised and practically demonstrated in the lab in direction of understanding for industrial application. Previously, Taj research interest is included; thin solid film of semiconductors, metal nanoparticle film, high power laser-mater interaction, atmospheric-PLD, the SERS effect of plasmonic materials, Raman spectroscopy, and Photoluminescence. Taj is also a reviewer and member of the editorial board of serval journals. Taj has published several research articles in peer-reviewed journals of a good reputation. Taj is a good speaker and has the honor as an invited speaker in international seminars, workshops, and conferences.

research interest

  • Nanomaterials and nanotechnology (in general)
  • High power laser-matter interaction and laser ablation
  • Vacuum pulsed laser deposition (PLD) and atmospheric-PLD
  • Metal nanoparticle films for surface-enhanced Raman spectroscopy (SERS) and catalysis applications
  • Atmospheric pressure dielectric barrier discharge (DBD) and Laser-triggered thermal plasmas for functional nanomaterials
  • Semiconductor thin solid films
  • Surface etching using RF reactive ion etching and DBD plasma sources

Certificate

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Acceptance Letter

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